Apparatus for removing a pellicle frame from a photomask and the method thereof

ABSTRACT

An apparatus for removing a pellicle frame from a photomask includes a heater, a shower head, and a gripper. The heater is configured to soften a portion of an adhesive between the pellicle frame and the photomask. The shower head facing to the heater and configured to provide a flow from a patterned area of the photomask toward the pellicle frame and the adhesive. The gripper is configured to secure the pellicle frame against the flow and to remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame from a photomask includes providing a flow from a pattern area of the photomask toward the pellicle frame and an adhesive; securing the pellicle frame in a force-transmitting manner against the flow; soften at least a portion of the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.

PRIORITY CLAIM AND CROSS REFERENCE

This application is a continuation application of a U.S. patentapplication entitled APPARATUS FOR REMOVING A PELLICLE FRAME FROM APHOTOMASK AND THE METHOD THEREOF, Ser. No. 16/114,849, filed Sep. 3,2018.

BACKGROUND

In the manufacturing of integrated circuit devices, photomasks,alternatively referred to as photoreticles or reticles, are used toproject patterns for the integrated circuits on a semiconductor wafer.To protect the photomask from contamination, which can cause errors inthe projected patterns, the photomask has been provided with a pelliclecomprised of a pellicle frame and an optically transparent membrane. Anadhesive is used to bond the pellicle frame to a surface of thephotomask, and the membrane is stretched across the pellicle frame.

Reasons for removing the pellicle include repairing a defect detected inthe photomask, removing haze contamination that has formed on thephotomask under the pellicle, and replacing the pellicle due tomechanical damage or exposure damage. Haze contamination is aprecipitant formed from chemical residue from the photomask cleaning,impurity of fab or environmental exposure. Currently, precipitateddefects may be caused by airborne contamination from the environment,pellicle adhesive, photomask pod out-gassing, pellicle frame residue,chemical growth and deposition from the reactions, and mixing ofchemical solutions.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It shouldbe noted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a schematic drawing illustrating an apparatus for removing apellicle frame according to aspects of the present disclosure in one ormore embodiments.

FIG. 2 illustrates a shower head in accordance with embodiments of thepresent disclosure.

FIG. 3 illustrates a shower head in accordance with embodiments of thepresent disclosure.

FIG. 4 is a schematic drawing illustrating a photomask and a pellicleframe in accordance with embodiments of the present disclosure.

FIG. 5 illustrates a partial schematic in accordance with embodiments ofthe present disclosure.

FIG. 6 is a schematic drawing illustrating an apparatus for removing apellicle frame according to aspects of the present disclosure in one ormore embodiments.

FIG. 7 shows a flowchart representing a method for removing a pellicleframe from a photomask according to aspects of the present disclosure inone or more embodiments.

FIG. 8 is a schematic drawing illustrating an apparatus for removing apellicle frame according to aspects of the present disclosure in one ormore embodiments.

FIG. 9 is a schematic drawing illustrating an apparatus for removing apellicle frame according to aspects of the present disclosure in one ormore embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of elements and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper,” “on” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

As used herein, terms such as “first,” “second” and “third” describevarious elements, components, regions, layers and/or sections, theseelements, components, regions, layers and/or sections should not belimited by these terms. These terms may be only used to distinguish oneelement, component, region, layer or section from another. The termssuch as “first,” “second” and “third” when used herein do not imply asequence or order unless clearly indicated by the context.

Typically, the method of removing the pellicle from the photomaskincludes applying mechanical force to the pellicle frame to separate thepellicle frame from the photomask. Problems are encountered withmechanical separation, however, including incomplete adhesive removaland pellicle adhesive deposited in the pattern area of the photomask,referred to as stringers, both requiring time-consuming cleaning whichcan degrade the photomask to the point of being unusable. Damage canalso occur to the pattern on the photomask during mechanical separation,resulting in the photomask requiring costly repairs or needing to bereplaced. Further, the abovementioned removal process has previouslybeen carried out primarily only manually and fails to meet requirements.

The present disclosure therefore provides an apparatus for removing apellicle frame from a photomask and a method of removing a pellicleframe from a photomask to reduce damage or contamination to thephotomask. Consequently, during removal of the pellicle frame, apatterned area of the photomask may be fully prevented fromcontamination, and after removing the pellicle frame, there is noadhesive residue on the surface of the photomask. Further, the incorrectactions of the operators may be avoided by using automatic equipment.Accordingly, contamination and residue issues are mitigated and thusprocess yield is improved.

FIG. 1 is a cross-sectional view illustrating an apparatus 100 forremoving a pellicle frame 22 from a photomask 21 according to aspects ofthe present disclosure in some embodiments. Referring to FIG. 1, theapparatus 100 includes a shower head 11 and a gripper 31. The showerhead 11 is configured to provide an air curtain (not shown) between thepellicle frame 22 and a patterned area 23 of the photomask 21. Thegripper 31 is configured to secure the pellicle frame 22 from adirection against the flow blown from the air curtain, wherein the flowis substantially directed toward a periphery 211 of the photomask 21. Insome embodiments, the pellicle frame 22 is affixed to one side of thephotomask 22 by an adhesive 24 bond between the pellicle frame 22 andthe photomask 21. In some embodiments, the patterned area 23 issurrounded by the pellicle frame 22. In some embodiments, the photomask21 is held in the apparatus 100 with the patterned area 23 facing towarda direction along the gravity force.

In some embodiments, the shower head 11 is not in contact with thephotomask 21, so as not to damage the photomask 21. In some embodiments,the shower head is driven by a first driver 12 and is verticallyadjustable in relation to the photomask 21 in order to control thedistance between the photomask 21 and the shower head 11 and to ensurethe shower head 11 does not touch the patterned area 23. In someembodiments, the first driver 12 is automatic equipment that mayprecisely adjust the distance between the shower head 11 and thephotomask 21. Compared with the current manual adjustment, when theshower head 11 is adjusted by automatic equipment, such as the firstdriver 12, not only is the photomask 21 protected from furthercontamination or damage, but the adjustment of the relative position ofthe shower head 11 and the photomask 21 is more accurate, and theadjustment can be reproducible.

Please refer to FIGS. 2 and 3, wherein FIG. 2 is a bottom view of theshower head 11 and FIG. 3 is a side view of the shower head 1 in aspectsof the present disclosure in one or more embodiments. The shower head 11includes a cover 14 and plate 13 joined together. An accommodation space15 is formed by the cover 14 and plate 13. The plate 13 includes acentral region 131 and a peripheral region 132 defined thereon. In otherwords, the peripheral region 132 is defined between the central region131 of the plate 13 and the cover 14. The cover 14 includes acircumferential wall 141 connected to the peripheral region 132 of theplate 13. The plate 13 can be, but need not necessarily be, round, oval,rectangular, square or other desired shape corresponding to thepatterned area 23 of the photomask 21, which the pellicle frame 22surrounds. The cover 14 can be, but need not necessarily be, round,oval, rectangular, square or other desired shape corresponding to theplate 13. As shown in FIG. 2, the central region 131 can include a roundshape while the peripheral region 132 includes a ring shape encirclingthe central region 131. A plurality of gas outlets 142 is disposed onthe circumferential wall 141 of the cover 14. As shown in FIG. 3, aplurality of gas outlets 142 is disposed in the circumferential wall 141of the cover 14. In some embodiments, the gas outlets 142 are configuredto provide the air curtain (not shown) by blowing a flow directly towardthe periphery 211 of the photomask 21. In some embodiments, the gasoutlets 142 are arranged in concentric circles, but the disclosure isnot limited thereto. In some embodiments, each of the gas outlets 142has a same shape and a same pore diameter, but the disclosure is notlimited thereto. In some embodiments, a distance between any twoneighboring gas outlets 142 can be, for example but not limited to,consistent.

In some embodiments, the circumferential wall 141 is oriented at anangle θ in relation to the photomask 21 so that the flow blown from thegas outlets 142 is substantially directed toward the periphery 211 ofthe photomask 21. Due to the angle θ of the circumferential wall 141,the flow blown from the air curtain is substantially directed toward theperiphery 211 of the photomask 21, dust, contaminants and anyby-products produced during the removal of the pellicle frame 22 will beblown away from the patterned area 23, and the patterned area 23 may notbe contaminated. In some embodiments, the angle θ ranges from 90° to180°.

In some embodiments, the flow is allowed to blow through the gas outlets142, thereby providing the air curtain between the pellicle frame 22 andthe patterned area 23. The air curtain cooperates with the shower head11 to prevent dust or contaminants from entering the patterned area 23during operation. In some embodiments, the flow creates positivepressure from the patterned area 23 toward the pellicle frame 22 and theadhesive 24. In some embodiments, the air curtain is formed withnitrogen gas, oxygen gas, or argon. In some embodiments, the air curtainis formed with nitrogen gas. In some embodiments, the purity of thenitrogen gas is 99.999%. In some embodiments, the shower head 11 furtherconnects to a gas supply through various apparatuses such as gas tube,pressure regulators, valves, mass flow controllers, or other flowcontrollers, manifolds, and/or regulators. In some embodiments, the gassupply can be integrated with the shower head 11.

Please refer to FIGS. 4 and 5, wherein FIG. 4 is a schematic drawing ofthe photomask 11 and the pellicle frame 12 and FIG. 5 is a schematicdrawing of the gripper 31 in aspects of the present disclosure in one ormore embodiments. For the purpose of removing the pellicle frame 22 froma photomask 21, a secure fixing of the pellicle frame 22 duringoperation is desired. The gripper 31 is configured to secure thepellicle frame 22 in a force-transmitting and shape-matched manner froma direction against the flow blown from the air curtain. In someembodiments, the pellicle frame 22 can be held at two oppositelydisposed sides by means of two grippers 31.

As shown in FIG. 4, in some embodiments, the pellicle frame 22 typicallyranges from about 3 mm in height to about 6.35 mm in height. Heights ofother typical pellicle frames 22 are about 3.15, 4, 5, or 6 mm. In someembodiments, the design of the gripper 31 can be used to match thepellicle frame 22 of any height. The geometrical design and dimension ofthe pellicle frame 22 has no particular limits, and can be, but need notnecessarily be, round, oval, rectangular, square or other desired shape.In some embodiments, mounts 221 are provided at the radially outer edgeof the pellicle frame 22 in the form of blind holes. The mounts 221 canbe arranged at different positions depending on the geometrical designand dimension of the pellicle frame 22. In some embodiments, thepellicle frame 22 which is generally rectangular in shape, four mounts221 are provided at the radially outer edge of the two long sides of thepellicle frame 22, each of the long sides of the pellicle frame 22 has apair of the mounts 221. In some embodiments, the pellicle frame 22 whichis generally rectangular in shape, four mounts 221 are provided at theradially outer edge of the two short sides of the pellicle frame 22,each of the short sides of the pellicle frame 22 has a pair of themounts 221.

As shown in FIG. 5, in some embodiments, the gripper 31 includes asupport arm 32 and at least one lift pin 33 protruding from the supportarm 32 for engaging and lifting the pellicle frame 22. In someembodiments, the support arm 32 has an inner channel 321 foraccommodating a coolant 34. In some embodiments, the support arm 32 maybe pressed against the pellicle frame 22 and allow thermal transfercooling of the pellicle frame 22 and a portion of the adhesive 24. Insome embodiments, the support arm 32 is made from a material having highheat transfer rate and low coefficient of thermal expansion to increasethe transfer of heat from the pellicle frame 22 to the coolant 34 whilemaintaining sufficient strength to secure the pellicle frame 22. In someembodiments, the support arm 32 is made from titanium, iron-nickel alloyor stainless steel.

The number of the support arm 32 has no particular limits, and can bearranged depending on the geometrical design and dimension of thepellicle frame 22. In some embodiments, the gripper 31 has two supportarms 32. In some embodiments, the pellicle frame 22 which is generallyrectangular in shape is secured on two opposite sides by the supportarms 32. In some embodiments, two support arms 32 are fixed to the twolong sides of the pellicle frame 22. In some embodiments, two supportarms 32 are fixed to the two short sides of the pellicle frame 22.

In some embodiments, the gripper 31 has four support arms 32. In someembodiments, the pellicle frame 22 is generally rectangular in shape,and the pellicle frame 22 is engaged on each of the four sides of thepellicle frame 22 by four support arms 32. In some embodiments, foursupport arms 32 are separated. The use of separated support arms 32allows the apparatus 100 to accommodate various shapes and sizes ofpellicle frames 22.

It is desirable that the coolant 34 utilized maintains the temperatureof a portion of the adhesive 24 attached to the pellicle frame 22sufficiently that the portion of the adhesive 24 remains solid and firm.In some embodiments, the coolant 34 is water. However, any othersuitable coolant 34 may be used, including liquid nitrogen, argon,oxygen, hydrogen, helium, fluorine, methane, neon, carbon monoxide, andthe combinations thereof. In some embodiments, the support arm 32containing the coolant 34 is placed in contact with the pellicle frame22 for a period of time. The amount of time for which the pellicle frame22 and the adhesive 24 are cooled will be affected by the type of thecoolant 34, the gripper 31, and the adhesive 24. In some embodiments,reducing the time of removing the pellicle frame 22 from the photomask21 is achieved by maximizing the contact between the support arm 32 withthe pellicle frame 22. In some embodiments, weep holes (not shown) arefurther provided in the support arm 32 to allow the coolant 34 closer tothe pellicle frame 22 to accelerate cooling.

The lift pin 33 functions for inserting into the mount 221 of thepellicle frame 22. In some embodiments, the gripper 31 is driven by asecond driver and is vertically adjustable to vertically remove thepellicle frame 22 from the photomask 21 and horizontal adjustable topress against the radially outer edge of the pellicle frame 22. In someembodiments, the second driver (not shown) is automatic equipment whichmay be precisely secured to the pellicle frame 22. Compared with thecurrent manual adjustment, when the gripper 31 is adjusted by automaticequipment, the relative position of the pellicle frame 22 and thegripper 31 can be adjusted accurately and can be reproducible. When thesecond driver (not shown) vertically adjusts the gripper 31 to move awayfrom the photomask 21, the pellicle frame 22 may be leveraged by thelift pin 33. It should be noted that the configuration of the lift pin33 must correspond to the mount 221 of the pellicle frame 22.

FIG. 6 is a schematic drawing illustrating the apparatus 100 accordingto aspects of the present disclosure in some embodiments. Referring toFIG. 6, in some embodiments, the apparatus 100 further includes a heater41 configured to heat the photomask 21 to an elevated temperature inorder to soften a portion of the adhesive 24 and to facilitate thecomplete separation of the pellicle frame 22 and the adhesive 24 fromthe photomask 21. The arrangement or type of the heater 41 is notparticularly limited as long as the adhesive 24 at the interface betweenthe photomask 21 and the adhesive 24 can be softened. In someembodiments, the heater 41 is attached to the photomask 21. In someembodiments, the heater 41 is disposed on a surface of the photomask 21opposite to the patterned area 23. In some embodiments, the elevationtemperature is adjusted according to the material of the adhesive. Insome embodiments, the heater 41 is attached to the photomask 21 for aperiod of time. The time may be impacted by the type of heater 41, thephotomask 21 and the adhesive 24.

Please refer to FIGS. 7 and 8. FIG. 7 shows a flowchart representing amethod of removing a pellicle frame 22 from a photomask 21 according toaspects of the present disclosure, and FIG. 8 is a schematic drawing ofthe apparatus in operation according to aspects of the presentdisclosure in one or more embodiments. In the present disclosure, amethod of removing a pellicle frame 22 from a photomask 500 is alsodisclosed. In some embodiments, a pellicle frame 22 may be removed fromthe photomask 21 by the method 500. The method 500 includes a number ofoperations and the description and illustration are not deemed as alimitation as the sequence of the operations. The method 500 includes anumber of operations 501, 502 as shown in FIG. 7.

The method 500 includes providing an air curtain between the pellicleframe 22 and the patterned area 23 of the photomask 21, and generating atemperature difference between the photomask 21 and the pellicle frame22. In operation 501, the flow of air curtain blow from the shower head11 is substantially directed toward a periphery 211 of the photomask 21as shown in FIG. 8, in order to fully protect the patterned area 23 ofthe photomask 21 from contamination. In operation 502, when the heater41 heats the photomask 21 to the elevation temperature and the pellicleframe 22 is cooled by the support arm 32 of the gripper 31, thetemperature difference is provided between the pellicle frame 22 and thephotomask 21. In some embodiments, the temperature difference causes aportion of the adhesive 24 bonded to the photomask 21 to soften, and therest of the adhesive 24 remains firm, so that the pellicle frame 22 andadhesive 24 can be detached from the photomask 21 by mechanical forceleaving little or no residue. In some embodiments, when the gripper 31is secured to the pellicle frame 22, and when the lift pin 33 of thegripper 31 is engaged in the mount 221 of the pellicle frame 22, thepellicle frame 22 and the adhesive 24 attached thereon are removedvertically from the photomask 21 by vertically adjusting the gripper 31.In some embodiments, a plurality of gripper 31 are removed verticallyfrom the photomask 21 at the same time, all of the lift pins 33 areraised simultaneously, thereby maintaining the pellicle frame 22 in asubstantially horizontal position throughout the lifting operation andseparating all portions of the pellicle frame 22 and the adhesive fromthe photomask 21 at the same time.

It should be noted that the air curtain is continuously supplied duringthe removal of the pellicle frame 22 and the adhesive 24, such that anymaterial that may contaminate the pattern area 23 will be blown towardthe periphery 211 of the photomask 21 by the flow of the air curtain.Further, after removing the pellicle frame 22, there is no adhesiveresidue on the surface of the photomask 21.

In some embodiments, the shower head 1 is adjusted by a first driver 12,and the gripper 31 is driven by a second driver. In some embodiments,the drivers are automatic equipment which may be accurately adjust therelative position between components and can precisely move thecomponents, making the method of operation reproducible.

In some embodiments, after the detachment of the pellicle frame 22 fromthe photomask 21, the pellicle frame 22 and the photomask 21 can betransported separately. Subsequently to this, the photomask 21 does notneed to be specially cleaned or repaired. In some embodiments, after thedetachment of the pellicle frame 22 from the photomask 21, the photomask21 can again be provided with a pellicle frame 22 and then insertedagain.

In some embodiments, a membrane that is stretched across the pellicleframe 22 is removed prior to removing the pellicle frame 22. In someembodiments, the material of the film is not particularly limited.

FIG. 8 is a cross-sectional view illustrating the apparatus 100according to aspects of the present disclosure in some embodiments.Referring to FIG. 8, in some embodiments, the apparatus 100 furtherincludes a cutter 61 for removing the membrane 25. In some embodiments,the cutter 61 includes a blade 62 configured to cut the membrane 25 anda vacuum pad 63 configured to suck the cut membrane 25. In someembodiments, the blade 62 extends to the radially inner edge of thepellicle frame 22. In some embodiments, the vacuum pad 63 provides avacuum suction to move the cut membrane 25 away from the pattern area 23without contaminating the pattern area 23. In some embodiments, themembrane 25 can be immediately sucked by the vacuum pad 63 once it hasbeen cut by the blade 62.

In some embodiments, the blade 62 can be, but need not necessarily be, along strip of blade bent into a round, oval, rectangular, square orother desired shape corresponding to the inner edge of the pellicleframe 22. In some embodiments, the cutter 61 includes a plurality ofblades 62, those blades 62 are not limited to being arranged in a round,oval, rectangular, square or other desired shape corresponding to theinner edge of the pellicle frame 22. In some embodiments, vacuum pad 63is surrounded by the blade 62, and the number of the vacuum pad 63 isnot particularly limited.

In some embodiments, the cutter 61 is driven by a third driver 64 and isvertically adjustable. In some embodiments, the third driver 64 providessufficient strength causing the blade 62 to cut the membrane 25 alongthe inner edge of the pellicle frame 12. Ones the membrane 25 is cut,the cut membrane 25 will be sucked by the vacuum pad 63. In someembodiments, the third driver 64 is automatic equipment which mayprecisely approach the membrane 25 at a predetermined speed and evenlycut the membrane 25. Compared with the current manual adjustment, whenthe cutter 61 is adjusted by automatic equipment, the relative positionsof the membrane 25 and the cutter 61 can be adjusted accurately, can bereproducible, and can evenly apply mechanical force to the membrane 25until the membrane 25 is cut. In some embodiments, the predeterminedspeed is adjusted according to the material of the membrane 25 to avoidmembrane fragmentation. In some embodiments, the predetermined speed isless when the membrane 25 is soft and faster when the membrane 25 ishard. In some embodiments, when the cutter 61 is moved to a positionwhere the blade 62 just touches the membrane 25, the distance d betweenthe vacuum pad 63 and the membrane 25 is 1 mm. By precisely controllingthe distance d, once the membrane 25 is cut by the blade 62, it can beimmediately sucked by the vacuum pad 63 without contaminating thepatterned area 23.

In some embodiments, the pellicle frame 22 located around the patternedsurface 23 of the photomask 21 faces toward a direction along thegravity force, and the cutter is located below the membrane 25. In someembodiments, ones the membrane 25 is cut, the cut membrane 25 falls ontothe vacuum pad 63 due to gravity and is sucked by the vacuum pad 63, anddoes not stick to the pattern area 23 to cause contamination.

Accordingly, the present disclosure therefore provides an apparatus forremoving a pellicle frame from a photomask and a method of removing apellicle frame from a photomask. Consequently, the pellicle frame 22 andthe adhesive 24 can be completely removed without contaminating thephotomask 21, and the lifetime of the photomask 21 has significantlyincreased.

In some embodiments, an apparatus for removing a pellicle frame from aphotomask is provided. The apparatus includes a shower head configuredto provide an air curtain between the pellicle frame and a patternedarea of the photomask, and a gripper configured to secure the pellicleframe from a direction against the flow blown from the air curtain. Insome embodiments, the flow is substantially directed toward a peripheryof the photomask.

In some embodiments, a method of removing a pellicle frame from aphotomask is provided. The method includes providing an air curtainbetween the pellicle frame and a patterned area of the photomask, andgenerating a temperature difference between the photomask and thepellicle frame. In some embodiments, the flow of the air curtain issubstantially directed toward a periphery of the photomask. In someembodiments, the temperature of the photomask is higher than thetemperature of the pellicle frame.

In some embodiments, another method of removing a pellicle frame from aphotomask is provided. The method includes cutting a membrane stretchedacross the pellicle frame to expose a patterned area of the photomask,providing an air curtain between the pellicle frame and the patternedarea of the photomask, and generating a temperature difference betweenthe photomask and the pellicle frame. In some embodiments, the flow ofair curtain is substantially directed toward a periphery of thephotomask. In some embodiments, the temperature of the photomask ishigher than the temperature of the pellicle frame.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. An apparatus for removing a pellicle frame from aphotomask, comprising: a heater configured to soften at least a portionof an adhesive between the pellicle frame and the photomask; a showerhead facing to the heater and configured to provide a flow from apatterned area of the photomask toward the pellicle frame and theadhesive; and a gripper configured to secure the pellicle frame againstthe flow and to remove the adhesive and the pellicle frame away from thephotomask.
 2. The apparatus of claim 1, wherein the gripper has an innerchannel for accommodating a coolant.
 3. The apparatus of claim 1,wherein the gripper further includes a lift pin for engaging and liftingthe pellicle frame, and includes a support arm and the lift pinprotrudes from the support arm.
 4. The apparatus of claim 1, wherein theflow includes nitrogen gas.
 5. The apparatus of claim 1, wherein theshower head includes a cover and plate joined with the cover, anaccommodation space is formed by the plate and the cover, the plateincludes a central region and a peripheral region defined between thecentral region and the cover, the cover includes a circumferential wallconnected to the peripheral region of the plate, and a plurality of gasoutlets are disposed on the circumferential wall of the cover.
 6. Theapparatus of claim 1, wherein the heater is disposed on a surface of thephotomask opposite to the patterned area.
 7. The apparatus of claim 1,further comprising a cutter configured to cut a membrane stretchedacross the pellicle frame in order to expose the patterned area of thephotomask.
 8. The apparatus of claim 7, wherein the cutter furtherincludes a blade configured to cut the membrane and a vacuum padconfigured to suck the membrane.
 9. The apparatus of claim 1, whereinthe shower head is driven by a first driver and is vertically adjustablein relation to the photomask, and the gripper is driven by a seconddriver and is vertically adjustable to vertically remove the pellicleframe from the photomask and horizontally adjustable to press againstthe pellicle frame.
 10. The apparatus of claim 7, wherein the cutter isdriven by a third driver and is vertically adjustable in relation to themembrane.
 11. A method of removing a pellicle frame from a photomask,comprising: providing a flow from a pattern area of the photomask towardthe pellicle frame and an adhesive between the pellicle frame and thephotomask; securing the pellicle frame in a force-transmitting manneragainst the flow; soften at least a portion of the adhesive; andleveraging the pellicle frame to remove the adhesive and the pellicleframe away from the photomask.
 12. The method of claim 11, furthercomprising cooling the pellicle frame.
 13. The method of claim 11,wherein the portion of the adhesive is soften by heating the photomask.14. The method of claim 11, the portion of the adhesive is soften bygenerating a temperature difference between the photomask and thepellicle frame, wherein the temperature of the photomask is higher thanthe temperature of the pellicle frame.
 15. The method of claim 11,wherein the pellicle frame is secured by engaging a lift pin of agripper into the pellicle frame.
 16. The method of claim 15, wherein thepellicle frame is leveraged by the lift pin while moving the gripperaway from the photomask.
 17. The method of claim 11, wherein theprovision of the flow and the leveraging of the pellicle frame areimplemented simultaneously.
 18. A method of removing a pellicle framefrom a photomask, comprising: cutting a membrane stretched across thepellicle frame to expose a patterned area of the photomask; providing aflow from the pattern area of the photomask toward the pellicle frameand an adhesive between the pellicle frame and the photomask; and softenat least a portion of an adhesive between the pellicle frame and thephotomask.
 19. The method of claim 18, further comprising adjusting thepellicle frame located around the patterned surface of the photomask toface toward a direction along the gravity force.
 20. The method of claim18, wherein the portion of the adhesive is soften by disposing a heateron a surface of the photomask opposite to the patterned area.